HfO2, 50-80nm, 99.5% Hafnium Oxide Nanoparticles are widely used in industries as a gate dielectric system of microelectronic devices and reduce the leakage current in the miniaturization of modern devices. These nanoparticles are produced with the help of pioneering in-house tools and techniques. Owing to their top-notch quality and performance, we are experiencing a huge demand for the HfO2, 50-80nm, 99.5% Hafnium Oxide Nanoparticles in the marketplace. Our customers can get the product delivered to their doorstep within the stipulated time frame.